Methods and systems to enhance process uniformity

ABSTRACT

A semiconductor processing chamber may include a remote plasma region, and a processing region fluidly coupled with the remote plasma region. The processing region may be configured to house a substrate on a support pedestal. The support pedestal may include a first material at an interior region of the pedestal. The support pedestal may also include an annular member coupled with a distal portion of the pedestal or at an exterior region of the pedestal. The annular member may include a second material different from the first material.

TECHNICAL FIELD

The present technology relates to semiconductor processes and equipment. More specifically, the present technology relates to improving process uniformity during etching operations.

BACKGROUND

Integrated circuits are made possible by processes which produce intricately patterned material layers on substrate surfaces. Producing patterned material on a substrate requires controlled methods for removal of exposed material. The same procedure may be performed on many substrates, and process conditions and results are often held within tight tolerances. Often when etching or removal operations are performed, uniformity across a substrate is difficult to maintain.

In many situations, based on a chamber configuration or process conditions, maintaining uniformity of removal operations may be difficult to control. Although process conditions may be adjusted, tolerances on process conditions may limit the amount or extent of modifications available. For this reason, uniformity can only be controlled via process conditions to a limited extent.

Thus, there is a need for improved system components that can allow improved uniformity of process conditions across an entire surface of a substrate from the central region to the edge regions. These and other needs are addressed by the present technology.

SUMMARY

Methods and systems for improving process uniformity are described, and an exemplary semiconductor processing chamber may include a remote plasma region, and a processing region fluidly coupled with the remote plasma region. The processing region may be configured to house a substrate on a support pedestal. The support pedestal may include a first material at an interior region of the pedestal. The support pedestal may also include an annular member coupled with a distal portion of the pedestal or at an exterior region of the pedestal. The annular member may include a second material different from the first material.

The annular member may include a first material plated with the second material, and in embodiments, the second material may not be disposed on surfaces of the annular member in contact with the support pedestal. The annular member may extend along an external edge of the pedestal towards a stem region of the pedestal. The support pedestal may include an upper surface, and the annular member may extend vertically above the upper surface of the support pedestal in embodiments. The annular member may be coupled with the support pedestal at an edge region beyond the dimensions of a centrally located substrate region. In embodiments, fluorine may have a higher affinity to the second material than the first material, and the second material may include nickel or platinum. The processing region may be at least partially defined by a sidewall, and in embodiments the sidewall may include the second material. Additionally, a sidewall heating element may be embedded in the sidewall proximate the showerhead. The support pedestal may also include a pedestal temperature control, and the pedestal temperature control may be configured to maintain the pedestal at a first temperature, while the sidewall heating element may be configured to maintain the annular member at a second temperature. In embodiments the second temperature may be greater than the first temperature.

Semiconductor chambers are also described, that may include a remote plasma region and a processing region fluidly coupled with the remote plasma region. In exemplary chambers, the processing region may be at least partially defined by each of a showerhead, a substrate support pedestal that includes a first material, and a sidewall. The sidewall may include an interior liner comprising a second material different from the first material, and may also include a resistive heater embedded in the sidewall. In embodiments, the pedestal may include a platform coupled with a stem. Additionally, the liner may be disposed on the sidewall from the showerhead to a distance proximate the intersection between the coupled platform and stem. In embodiments, the pedestal may include a temperature control, and the temperature control may be configured to maintain a substrate temperature at least 20° C. below the sidewall temperature maintained by the resistive heater. Also, the resistive heater may be located within the sidewall proximate the showerhead.

Methods of etching a substrate are also described, and may include delivering plasma effluents through a showerhead into a semiconductor processing region. The methods may include contacting a substrate residing on a support pedestal with the plasma effluents. The support pedestal may include a first material, which may be aluminum in embodiments, and the support pedestal may also include an annular member coupled with a distal portion of the pedestal. The annular member may include a second material different from the first material in embodiments of the present technology. The methods may also include substantially maintaining the annular member at a temperature above about 50° C. Additionally, the methods may include maintaining the processing region substantially devoid of plasma during the contacting operation. Utilizing the systems and methods of the present technology, an edge etch rate of the substrate may be maintained within about 5% or less of a central etch rate of the substrate.

Such technology may provide numerous benefits over conventional systems and techniques. For example, edge etch rates may be within a small variation of central etch rates. An additional advantage is that this consistency of etching operations may increase the usable area of a substrate surface. These and other embodiments, along with many of their advantages and features, are described in more detail in conjunction with the below description and attached figures.

BRIEF DESCRIPTION OF THE DRAWINGS

A further understanding of the nature and advantages of the disclosed technology may be realized by reference to the remaining portions of the specification and the drawings.

FIG. 1 shows a top plan view of one embodiment of an exemplary processing system.

FIG. 2A shows a schematic cross-sectional view of an exemplary processing chamber.

FIG. 2B shows a detailed view of a portion of the processing chamber illustrated in FIG. 2A.

FIG. 3 shows a bottom plan view of an exemplary showerhead according to the disclosed technology.

FIG. 4 shows a plan view of an exemplary faceplate according to the disclosed technology.

FIG. 5 shows a schematic cross-sectional view of a portion of the processing chamber illustrated in FIG. 2A along line A-A according to embodiments of the disclosed technology.

FIG. 6 shows a flowchart of a method of etching a substrate according to embodiments of the present technology.

FIGS. 7A-7B show etch rate data collected with and without improvements according to the present technology.

Several of the Figures are included as schematics. It is to be understood that the Figures are for illustrative purposes, and are not to be considered of scale unless specifically stated to be as such.

In the appended figures, similar components and/or features may have the same reference label. Further, various components of the same type may be distinguished by following the reference label by a letter that distinguishes among the similar components. If only the first reference label is used in the specification, the description is applicable to any one of the similar components having the same first reference label irrespective of the letter.

DETAILED DESCRIPTION

The present technology includes systems and components for semiconductor processing. Processing chambers have a signature operational profile based on many factors including operating conditions, precursor delivery, and chamber configuration. For example, processing chambers delivering precursors to a substrate processing region may not uniformly deliver the precursors into the space. Precursors may be delivered from the edge of the chamber towards the center of the chamber, which may expose edge regions of a substrate to more of the precursor components than the central region of the substrate. Additionally, precursors may be delivered from the central region outwards, which may expose a central region of a substrate to more of the precursor components than the edge regions. Despite many chamber components, including gas boxes, which may be used to improve uniformity of delivery, variations may still be present in precursor delivery across a cross-section of a processing chamber.

In etching operations, precursors may be delivered to a processing region to interact with materials on a substrate to remove those materials. Adjusting precursor components and processing conditions may affect which materials and at what rates materials are etched. These components may be excited in a plasma to increase their chemical reactivity. In certain processes, a plasma is used to excite the precursors, but the etching operation itself is still chemical in nature. For example, when plasma effluents of precursors are delivered through an ion suppression element as discussed below, neutral and radical species may be delivered to the substrate, but ionic species may be removed in part or in total to limit any plasma component of the etching operation. Accordingly, the etching occurs based on chemical interactions with the remaining effluents on the substrate.

Many etching operations utilize fluorine or fluorine-containing precursors to perform etching operations. The fluorine precursors may be excited in a plasma to produce fluorine radicals that may be delivered to and react chemically with materials on the substrate and subsequently be removed to pattern the substrate materials. In certain chamber configurations, the precursor components, including the plasma effluents, may be delivered to the processing region of the chamber from an edge region towards the center, which may expose edge regions of the substrate to more of the precursor components than the center region. Such precursor components may then expose the edge regions of the substrate to more reactive components than the center region, which may produce an edge etch rate that may be higher than a central etch rate. One example of this is shown in FIG. 7A below, where the edge region of a substrate was exposed to additional plasma effluents based on the chamber delivery mechanism, which produced an etch profile that preferentially etched the edge region over the central region.

Certain process conditions may be utilized to adjust this etch profile. For example, the pressure within the chamber may be adjusted or manipulated to affect the delivery and/or flow of the plasma effluents into the processing region thereby adjusting the etch profile. Moreover, by adding additional precursors, such as hydrogen, the uniformity profile of etching may be further adjusted. However, when chamber conditions are adjusted to affect flow regimes or when additional precursors are involved in the chemistries, although the uniformity profile can be adjusted, the etch rates may be detrimentally reduced, or the selectivity of an etching operation may be affected. To an extent, all of these adjustments may be made to affect the exposure of the edge regions to fluorine in comparison to the central regions of the substrate by manipulating the flow of precursors within the chamber, but they are performed at the expense of etch rates, which may be reduced with each modification. The present technology, however, provides an additional recombination source for the fluorine radicals along the edge region of the substrate that allows the edge etch rate to be brought into uniformity with a central region etch rate without reducing the overall etch rate of the process. This will be explained in detail with reference to the figures below.

Although the remaining disclosure will routinely identify specific etching processes utilizing the disclosed technology, it will be readily understood that the systems and methods are equally applicable to deposition and cleaning processes as may occur in the described chambers. Accordingly, the technology should not be considered to be so limited as for use with etching processes alone.

FIG. 1 shows a top plan view of one embodiment of a processing system 100 of deposition, etching, baking, and curing chambers according to embodiments. In the figure, a pair of front opening unified pods (FOUPs) 102 supply substrates of a variety of sizes that are received by robotic arms 104 and placed into a low pressure holding area 106 before being placed into one of the substrate processing chambers 108 a-f, positioned in tandem sections 109 a-c. A second robotic arm 110 may be used to transport the substrate wafers from the holding area 106 to the substrate processing chambers 108 a-f and back. Each substrate processing chamber 108 a-f, can be outfitted to perform a number of substrate processing operations including the dry etch processes described herein in addition to cyclical layer deposition (CLD), atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), etch, pre-clean, degas, orientation, and other substrate processes.

The substrate processing chambers 108 a-f may include one or more system components for depositing, annealing, curing and/or etching a dielectric film on the substrate wafer. In one configuration, two pairs of the processing chamber, e.g., 108 c-d and 108 e-f, may be used to deposit dielectric material on the substrate, and the third pair of processing chambers, e.g., 108 a-b, may be used to etch the deposited dielectric. In another configuration, all three pairs of chambers, e.g., 108 a-f, may be configured to etch a dielectric film on the substrate. Any one or more of the processes described may be carried out in chamber(s) separated from the fabrication system shown in different embodiments. It will be appreciated that additional configurations of deposition, etching, annealing, and curing chambers for dielectric films are contemplated by system 100.

FIG. 2A shows a cross-sectional view of an exemplary process chamber system 200 with partitioned plasma generation regions within the processing chamber. During film etching, e.g., titanium nitride, tantalum nitride, tungsten, silicon, polysilicon, silicon oxide, silicon nitride, silicon oxynitride, silicon oxycarbide, etc., a process gas may be flowed into the first plasma region 215 through a gas inlet assembly 205. A remote plasma system (RPS) 201 may optionally be included in the system, and may process a first gas which then travels through gas inlet assembly 205. The inlet assembly 205 may include two or more distinct gas supply channels where the second channel (not shown) may bypass the RPS 201, if included.

A cooling plate 203, faceplate 217, ion suppressor 223, showerhead 225, and a substrate support 265, having a substrate 255 disposed thereon, are shown and may each be included according to embodiments. The pedestal 265 may have a heat exchange channel through which a heat exchange fluid flows to control the temperature of the substrate, which may be operated to heat and/or cool the substrate or wafer during processing operations. The wafer support platter of the pedestal 265, which may comprise aluminum, ceramic, or a combination thereof, may also be resistively heated in order to achieve relatively high temperatures, such as from up to or about 100° C. to above or about 1100° C., using an embedded resistive heater element.

The faceplate 217 may be pyramidal, conical, or of another similar structure with a narrow top portion expanding to a wide bottom portion. The faceplate 217 may additionally be flat as shown and include a plurality of through-channels used to distribute process gases. Plasma generating gases and/or plasma excited species, depending on use of the RPS 201, may pass through a plurality of holes, shown in FIG. 2B, in faceplate 217 for a more uniform delivery into the first plasma region 215.

Exemplary configurations may include having the gas inlet assembly 205 open into a gas supply region 258 partitioned from the first plasma region 215 by faceplate 217 so that the gases/species flow through the holes in the faceplate 217 into the first plasma region 215. Structural and operational features may be selected to prevent significant backflow of plasma from the first plasma region 215 back into the supply region 258, gas inlet assembly 205, and fluid supply system 210. The faceplate 217, or a conductive top portion of the chamber, and showerhead 225 are shown with an insulating ring 220 located between the features, which allows an AC potential to be applied to the faceplate 217 relative to showerhead 225 and/or ion suppressor 223. The insulating ring 220 may be positioned between the faceplate 217 and the showerhead 225 and/or ion suppressor 223 enabling a capacitively coupled plasma (CCP) to be formed in the first plasma region. A baffle (not shown) may additionally be located in the first plasma region 215, or otherwise coupled with gas inlet assembly 205, to affect the flow of fluid into the region through gas inlet assembly 205.

The ion suppressor 223 may comprise a plate or other geometry that defines a plurality of apertures throughout the structure that are configured to suppress the migration of ionically-charged species out of the plasma excitation region 215 while allowing uncharged neutral or radical species to pass through the ion suppressor 223 into an activated gas delivery region between the suppressor and the showerhead. In embodiments, the ion suppressor 223 may comprise a perforated plate with a variety of aperture configurations. These uncharged species may include highly reactive species that are transported with less reactive carrier gas through the apertures. As noted above, the migration of ionic species through the holes may be reduced, and in some instances completely suppressed. Controlling the amount of ionic species passing through the ion suppressor 223 may advantageously provide increased control over the gas mixture brought into contact with the underlying wafer substrate, which in turn may increase control of the deposition and/or etch characteristics of the gas mixture. For example, adjustments in the ion concentration of the gas mixture can significantly alter its etch selectivity, e.g., SiNx:SiOx etch ratios, Si:SiOx etch ratios, etc. In alternative embodiments in which deposition is performed, it can also shift the balance of conformal-to-flowable style depositions for dielectric materials.

The plurality of apertures in the ion suppressor 223 may be configured to control the passage of the activated gas, i.e., the ionic, radical, and/or neutral species, through the ion suppressor 223. For example, the aspect ratio of the holes, or the hole diameter to length, and/or the geometry of the holes may be controlled so that the flow of ionically-charged species in the activated gas passing through the ion suppressor 223 is reduced. The holes in the ion suppressor 223 may include a tapered portion that faces the plasma excitation region 215, and a cylindrical portion that faces the showerhead 225. The cylindrical portion may be shaped and dimensioned to control the flow of ionic species passing to the showerhead 225. An adjustable electrical bias may also be applied to the ion suppressor 223 as an additional means to control the flow of ionic species through the suppressor.

The ion suppressor 223 may function to reduce or eliminate the amount of ionically charged species traveling from the plasma generation region to the substrate. Uncharged neutral and radical species may still pass through the openings in the ion suppressor to react with the substrate. It should be noted that the complete elimination of ionically charged species in the reaction region surrounding the substrate may not be performed in embodiments. In certain instances, ionic species are intended to reach the substrate in order to perform the etch and/or deposition process. In these instances, the ion suppressor may help to control the concentration of ionic species in the reaction region at a level that assists the process.

Showerhead 225 in combination with ion suppressor 223 may allow a plasma present in chamber plasma region 215 to avoid directly exciting gases in substrate processing region 233, while still allowing excited species to travel from chamber plasma region 215 into substrate processing region 233. In this way, the chamber may be configured to prevent the plasma from contacting a substrate 255 being etched. This may advantageously protect a variety of intricate structures and films patterned on the substrate, which may be damaged, dislocated, or otherwise warped if directly contacted by a generated plasma. Additionally, when plasma is allowed to contact the substrate or approach the substrate level, the rate at which oxide species etch may increase. Accordingly, if an exposed region of material is oxide, this material may be further protected by maintaining the plasma remotely from the substrate.

The processing system may further include a power supply 240 electrically coupled with the processing chamber to provide electric power to the faceplate 217, ion suppressor 223, showerhead 225, and/or pedestal 265 to generate a plasma in the first plasma region 215 or processing region 233. The power supply may be configured to deliver an adjustable amount of power to the chamber depending on the process performed. Such a configuration may allow for a tunable plasma to be used in the processes being performed. Unlike a remote plasma unit, which is often presented with on or off functionality, a tunable plasma may be configured to deliver a specific amount of power to the plasma region 215. This in turn may allow development of particular plasma characteristics such that precursors may be dissociated in specific ways to enhance the etching profiles produced by these precursors.

A plasma may be ignited either in chamber plasma region 215 above showerhead 225 or substrate processing region 233 below showerhead 225. Plasma may be present in chamber plasma region 215 to produce the radical precursors from an inflow of, for example, a fluorine-containing precursor or other precursor. An AC voltage typically in the radio frequency (RF) range may be applied between the conductive top portion of the processing chamber, such as faceplate 217, and showerhead 225 and/or ion suppressor 223 to ignite a plasma in chamber plasma region 215 during deposition. An RF power supply may generate a high RF frequency of 13.56 MHz but may also generate other frequencies alone or in combination with the 13.56 MHz frequency.

FIG. 2B shows a detailed view 253 of the features affecting the processing gas distribution through faceplate 217. As shown in FIGS. 2A and 2B, faceplate 217, cooling plate 203, and gas inlet assembly 205 intersect to define a gas supply region 258 into which process gases may be delivered from gas inlet 205. The gases may fill the gas supply region 258 and flow to first plasma region 215 through apertures 259 in faceplate 217. The apertures 259 may be configured to direct flow in a substantially unidirectional manner such that process gases may flow into processing region 233, but may be partially or fully prevented from backflow into the gas supply region 258 after traversing the faceplate 217.

The gas distribution assemblies such as showerhead 225 for use in the processing chamber section 200 may be referred to as dual channel showerheads (DCSH) and are additionally detailed in the embodiments described in FIG. 3 as well as FIG. 4 herein. The dual channel showerhead may provide for etching processes that allow for separation of etchants outside of the processing region 233 to provide limited interaction with chamber components and each other prior to being delivered into the processing region.

The showerhead 225 may comprise an upper plate 214 and a lower plate 216. The plates may be coupled with one another to define a volume 218 between the plates. The coupling of the plates may be so as to provide first fluid channels 219 through the upper and lower plates, and second fluid channels 221 through the lower plate 216. The formed channels may be configured to provide fluid access from the volume 218 through the lower plate 216 via second fluid channels 221 alone, and the first fluid channels 219 may be fluidly isolated from the volume 218 between the plates and the second fluid channels 221. The volume 218 may be fluidly accessible through a side of the gas distribution assembly 225.

FIG. 3 is a bottom view of a showerhead 325 for use with a processing chamber according to embodiments. Showerhead 325 corresponds with the showerhead shown in FIG. 2A. Through-holes 365, which show a view of first fluid channels 219, may have a plurality of shapes and configurations in order to control and affect the flow of precursors through the showerhead 225. Small holes 375, which show a view of second fluid channels 221, may be distributed substantially evenly over the surface of the showerhead, even amongst the through-holes 365, and may help to provide more even mixing of the precursors as they exit the showerhead than other configurations.

An arrangement for a faceplate according to embodiments is shown in FIG. 4. As shown, the faceplate 400 may comprise a perforated plate or manifold. The assembly of the faceplate may be similar to the showerhead as shown in FIG. 3, or may include a design configured specifically for distribution patterns of precursor gases. Faceplate 400 may include an annular frame 410 positioned in various arrangements within an exemplary processing chamber, such as the chamber as shown in FIG. 2. On or within the frame may be coupled a plate 420, which may be similar in embodiments to ion suppressor plate 223 as previously described. In embodiments faceplate 400 may be a single-piece design where the frame 410 and plate 420 are a single piece of material.

The plate may have a disc shape and be seated on or within the frame 410. The plate may be a conductive material such as a metal including aluminum, as well as other conductive materials that allow the plate to serve as an electrode for use in a plasma arrangement as previously described. The plate may be of a variety of thicknesses, and may include a plurality of apertures 465 defined within the plate. An exemplary arrangement as shown in FIG. 4 may include a pattern as previously described with reference to the arrangement in FIG. 3, and may include a series of rings of apertures in a geometric pattern, such as a hexagon as shown. As would be understood, the pattern illustrated is exemplary and it is to be understood that a variety of patterns, hole arrangements, and hole spacing are encompassed in the design.

The apertures 465 may be sized or otherwise configured to allow fluids to be flowed through the apertures during operation. The apertures may be sized less than about 2 inches in various embodiments, and may be less than or about 1.5 inches, about 1 inch, about 0.9 inches, about 0.8 inches, about 0.75 inches, about 0.7 inches, about 0.65 inches, about 0.6 inches, about 0.55 inches, about 0.5 inches, about 0.45 inches, about 0.4 inches, about 0.35 inches, about 0.3 inches, about 0.25 inches, about 0.2 inches, about 0.15 inches, about 0.1 inches, about 0.05 inches, etc. or less.

Turning to FIG. 5 is shown a sectional view along line A-A shown in FIG. 2A. This sectional view shows a portion of a chamber 500 including the bottom of the showerhead 525, relating to showerhead 225 in FIG. 2A, and pedestal 565, relating to pedestal 265 in FIG. 2A.

The chamber may include some or all of the components previously described. The illustration also includes a portion of the sidewalls of the chamber 521, 522 that may help define the substrate processing region 533 along with the showerhead 525 and pedestal 565. Although not shown in the figure, above the showerhead and/or an ion suppression plate as described previously may be a remote plasma region, such as region 215 or RPS unit 201 previously described.

Processing region 533 may be fluidly coupled with the remote plasma region, and may receive plasma effluents delivered to the processing region through showerhead 525. The processing region may be configured to house a substrate on support pedestal 565, such as on support platter 567. Support pedestal 565, and more specifically support platter 567, may include an interior region 568 and an exterior region 569 as illustrated. Exterior region 569 may include any region distal from the stem 570, or proximate the chamber sidewalls 522, 521. Support pedestal 565, which may include both support platter 567 and stem 570, may be made of or include in the composition a first material. The pedestal components may include aluminum, ceramic, or any number of materials useful in semiconductor processing equipment. The interior region of the pedestal 568 may include or also consist of the first material.

The support pedestal may also include an annular member 505 coupled with a distal portion of the pedestal, or at the exterior region 569 as illustrated. The annular member may include or consist of a second material different from the first material. Although termed annular, annular member 505 may take any number of forms based on the geometry of the pedestal 565 or support platter 567. For example, if the support platter is a square design, so may be the annular member 505, and any variety of geometries are to be understood as encompassed by the present technology. Annular member 505 may be coupled with the pedestal 565 in any number of direct or indirect ways including welding, fastening, bolting, etc. as would be understood. In embodiments, the annular member may include one or more ledges or ridges to enable more secure coupling with the pedestal 565.

The annular member may be made of the second material, and may also be made of the first material with the second material plated on or over the first material. The second material may be fully plated on all surfaces of the annular member, or in embodiments may not be disposed on surfaces of the annular member in contact with the support pedestal. For example, exterior region 507 of annular member 505 may include the second material, but interior region 508 in contact with pedestal 565 may not include the second material. In such a configuration, several benefits may be afforded including less likelihood of warping during operation, as well as the ability to maintain a more uniform temperature profile along the exterior region 569 of pedestal 565.

In disclosed embodiments, the annular member may extend along the exterior region 569 of the pedestal, or along an outer edge, towards the stem 570 as illustrated by dashed lines 510. By extending the annular member along the exterior surface or region of the pedestal, more surface area of the second material may be provided for interaction with the precursors and/or plasma effluents delivered into processing region 533. When a substrate is provided on support platter 567, the substrate may extend towards the exterior region 569 and may or may not contact the annular member 505. For example, the annular member may be coupled with the support pedestal at an edge region beyond the dimensions of a centrally located substrate region, such as interior region 568. For example, a substrate of 300 mm in diameter may reside exclusively within the interior region 568 and approach, but not contact annular member 505. It is to be understood that any substrate dimension may be utilized based on the chamber configuration, and adjustments to the present system that maintain the benefits discussed are encompassed, such as larger or smaller substrates on larger or smaller pedestals, where the annular member is not contacted by the substrate regardless of size.

Without intending to be bound to any particular theory, a discussion of possible or included mechanisms may be useful. As discussed previously, many etching operations utilize fluorine, or a fluorine-containing precursor, to interact with materials on a substrate, or with the substrate itself. The fluorine precursor may be excited in a plasma as previously discussed, and the plasma effluents may be provided to the processing chamber for contact and/or interaction with the substrate or materials on the substrate. Because of the flow profile of the precursors or plasma effluents, the exterior of the substrate, or edge regions proximate the outer region of the chamber, may be exposed to additional etchant materials. Fluorine, however, or fluoride radicals may include an affinity towards metallic surfaces, which may enable recombination to fluorine gas. Although the fluoride radicals may be highly reactive to perform chemical etching, recombined fluorine gas may not be reactive or may be less reactive, and may be pumped out of the processing region so as to not interact with the substrate.

For example, the annular member, or the second material of the annular member may be selected based on the affinity of fluorine to the material. Because many chamber components may be the same material or a first material, such as aluminum, the second material may be chosen based on the properties in relation to the first material. For example, fluorine has a certain affinity to aluminum. Fluorine has a higher affinity to other metals, including nickel or platinum, for example. Accordingly, the second material may be a material to which fluorine has a higher affinity than the first material. In this way, a certain amount of the fluoride radicals in the chamber may naturally flow towards the second material. As the number of radicals in an area increases and/or the radical species associate with the second material, the fluoride radicals may recombine with one another or other passing radical species to produce fluorine or fluorinated gas that may be removed from the system. This may then reduce the concentration of the fluoride radicals in the edge region of the chamber or along the edge region of the substrate, which may proportionately reduce the rate of etching along the edge region of the substrate.

Accordingly, by including the second material to which fluorine has a higher affinity in the annular member proximate the edge region of the substrate on the pedestal, the second material may help reduce the etch rate along the edge region. Additionally, such an adjustment may not affect or may minimally affect the central substrate region etch rate. Thus, while a desired overall etch rate may be maintained, by reducing the edge etch rate the overall etch process may be brought into relative or substantial uniformity across the entire surface of the substrate.

Additional adjustments within the system and/or chamber components may further aid this effect. These adjustments may be made in conjunction with the material selection, but may not be included in all embodiments. For example, annular member 505 may extend vertically above an upper surface of the support pedestal 565. As illustrated, support platter 567 may include an upper surface, or a surface on which a substrate may be configured to reside. The annular member 505 may be configured to be at a level above the upper surface or above the height of a substrate. Such a modification may affect the flow profile of the delivered precursors or plasma effluents, which may reduce the interaction at an edge region of a substrate, or provide increased area for interaction allowing recombination of fluoride radicals.

Temperature may also affect the fluorine affinity to the first and second material. For example, lower operating temperatures may reduce the affinity difference between metals or other materials, which may reduce the effect of the present technology. However, many processing operations may be performed with the substrate maintained at a relatively low temperature. Additional aspects of the technology may allow the affinity difference to be regained.

In disclosed embodiments the etch process may be performed at a temperature above or about 50° C., 80° C., 100° C., 150° C., etc. such that additional aspects of the technology may not be used. Disclosed embodiments may also be performed at a temperature below or about 100° C., 80° C., 50° C., 35° C., 10° C., etc., which may affect the affinity difference between the first material and the second material. One or more aspects of the present technology may be incorporated or used in lieu of the annular ring to regain the affinity difference.

As illustrated in FIG. 5, the processing region 533 may be at least partially defined by sidewalls 521, 522. The sidewall may include the second material, and/or may include a heating element in disclosed embodiments. As illustrated, heating element 520 may be included with or embedded in the sidewall 521. The heater may be located in any portion of the sidewall, and in embodiments may be included proximate the showerhead 525. The heater may be configured to heat the second material of the annular member 505, while limiting its impact on the support pedestal 565 or a substrate residing on the pedestal. As discussed previously, the support pedestal may include a pedestal temperature control, such as with fluid channels or embedded heaters 574 to either heat or cool the substrate during operations. Temperature control 574 is illustrated as a channel in FIG. 5, but is to be understood to encompass a variety of controls including resistive heating elements, and a variety of channel configurations including multiple channels, coils, etc.

In embodiments with a heating element 520, the pedestal temperature control may be configured to maintain the pedestal at a first temperature, while the sidewall heating element 520 may be configured to maintain the annular member at a second temperature. For example, the second temperature may be greater than the first temperature in embodiments. A variety of temperature effects may be included to adjust the fluorine affinity of the second material in relation to the first material. For example, the first temperature may be at about or below 200° C., 150° C., 100° C., 80° C., 50° C., 35° C., 10° C., −10° C., etc. The second temperature may be at about or above 40° C., 50° C., 80° C., 100° C., 150° C., 200° C., etc. so that the temperature difference between the second material of the annular member and the interior region 568 of the pedestal may be at about or above 10° C., 20° C., 30° C., 40° C., 50° C., 60° C., 80° C., 100° C., 150° C., etc. or more. By adjusting the temperature difference, the affinity effect may be adjusted to produce a particular adjustment to the edge etch rate in order to normalize the etch rate across the substrate surface.

The heating element 520 may be located within the sidewall 515 to maximize or increase its efficiency of operation, or maximize its effect on the second material of the annular member. In embodiments, the heating element 520 may be included proximate the showerhead 525, such as within about 1 inch or less, 0.5 inches or less, 0.05 inches or less, 0.01 inches or less, etc. By providing the heating element near the showerhead, the amount of energy absorbed by other sidewall or chamber components, such as sidewall 522, may be reduced, and the amount of energy provided to the second material of the annular member 505 may be enhanced.

Embodiments may also include a remote plasma region and semiconductor processing region as illustrated in FIGS. 2A and 5, for example. The processing region may be fluidly coupled with the remote plasma region, and may be at least partially defined by each of a showerhead 525, a substrate support pedestal 565 that may include a first material as previously discussed, and a sidewall or sidewall section 521. Sidewall section 521 may be coupled with but distinct from additional sidewall sections 522 in embodiments. The sidewall 521 may include an interior liner including a second material different from the first material, such as for example, nickel or platinum as the second material and aluminum as the first material. The liner may be located on a portion or all of the sidewall section, and may be located on an interior chamber surface, such as the surface at least partially defining the chamber processing region. However, it is to be understood that different first materials may be utilized, and the second material may be based on fluorine affinity to the first material, and the second material may be selected based on a higher fluorine affinity than to the first material. Hence, any number of materials may be used for the first and second materials and are encompassed by the present technology.

The sidewall 521 may include or consist of the second material, or in embodiments, the sidewall may include an interior liner 515 including the second material. The chamber may also include a resistive heater, such as heating element 520 embedded in the sidewall 521. As discussed previously, the resistive heater may be included or located within the sidewall proximate the showerhead. The liner 515 may be included along any portion of the chamber processing region, and may extend circumferentially about the chamber interior, such as along sidewall 521. The liner may also be incorporated in relation to the support pedestal, or where the support pedestal may be positioned during processing operations. For example, the pedestal 565 may include a platform 567 coupled with a stem 570 that during operation is moved to position the platform 567, on which a substrate may be located, within a certain distance to or from the showerhead 525.

The liner 515 may be disposed on the sidewall from the showerhead vertically along the sidewall 521 to a distance proximate the intersection between the coupled platform 567 and stem 570, when the platform is located in its operational position, such as during etching processes. Many pedestals are movable vertically towards and from the showerhead, and are moved closer to the showerhead during operation, although the distance may be greater, lesser, or adjusted during any process. For example, the pedestal may be in a lower position to more easily receive a substrate delivered into a chamber, and then raised towards the showerhead for processing. As illustrated in FIG. 5, when the pedestal is in its position for processing of a substrate, the liner 515 may be located along the sidewall 521 from the intersection of the showerhead 525, or a dielectric (not shown) that may isolate the showerhead from the sidewall, to a distance near, at, or below where platform 567 intersects stem 570.

The liner including the second material may operate in a similar way as the annular member 505, and may be used in conjunction with the annular member, or in lieu of the annular member in embodiments. The pedestal may also include a temperature control, such as fluid channel 574, to control a substrate temperature. The temperature control may be configured to maintain a substrate on the platform 567 at a temperature at least about 20° C. or more below the sidewall 521 temperature maintained by resistive heater 520. In operation, the liner may attract fluoride, which may have an affinity to the second material, which may allow recombination to fluorine or fluorinated gas, and reduce the edge etch rate as previously described to provide a more uniform etch rate across the surface of the substrate. Additionally, by including the second material in the liner, the temperature of the second material may be more easily controlled than with the annular member, which may have the temperature affected by both the heating element 520 as well as the pedestal temperature control.

The chambers previously discussed with relation to components described in FIGS. 2A and 5, may be used to perform a number of processes or operations, including substrate etch operations. Turning to FIG. 6 is shown one such method 600 for etching a substrate. The method may include providing a substrate to a chamber as well as any preprocessing operations that may also be performed within the chamber. At operations 610, plasma effluents may be delivered through a showerhead into a semiconductor processing region. A substrate residing on a support pedestal may be contacted with the plasma effluents at operation 620. The substrate support pedestal may include a first material, and may also include an annular member coupled with a distal portion of the pedestal. The annular member may also include a second material different from the first material as previously described. Operation 630 may include maintaining the annular member at a first temperature, which may include a temperature above about 50° C. in embodiments. This may be performed in any number of ways including if the natural process temperature is above about 50° C., or by utilizing any number of heating mechanisms as previously discussed. Optionally, operation 640 may include maintaining the substrate temperature at a second temperature based on the process conditions for etching, and the second temperature may be below or about 150° C. It is to be understood that the operations may be performed at any of the other temperatures or ranges as previously discussed as well.

Additional or alternative methods may include utilizing a chamber with a liner as previously described in relation to the chamber sidewalls, as well as a heating element embedded within the sidewall. The methods may be performed to utilize chemical reactions as opposed to direct plasma action on the substrate. For example, the chamber processing region may be substantially devoid of plasma during the contacting operation 620. This may occur by utilizing a remote plasma, and delivering the plasma effluents into the processing region as previously described.

The methods may allow a more uniform etching to be performed across the surface of the substrate, as illustrated by the data charts of FIGS. 7A and 7B. FIG. 7A illustrates an etching operation of a 300 mm wafer in a processing chamber without the annular ring or sidewall liner of the present technology. As illustrated, along the external regions of the wafer, shown by the X-axis, the etch rate increases greatly producing disuniformity of etching across the surface. FIG. 7B, however, includes an annular member such as previously described, which allows a uniform etch rate across the surface of the substrate. Additional outcomes may be realized with a liner and/or heating element in conjunction with or in lieu of the annular member. With the disclosed technology, the edge etch rate of the substrate may be maintained within about or less than +/−10% of the etch rate of an interior or central region of the substrate, and may be maintained within about or less than +/−7%, 5%, 3%, 1%, etc. of the central etch rate. Additionally, the central etch rate can be maintained at desired rates, and may not be suppressed by the present technology, as opposed to many processing operational changes that may help alleviate the edge etch rate issues, but may also suppress the central region etch rates detrimentally, which may increase queue times, precursor consumption, and operational costs of prolonged operations.

In the preceding description, for the purposes of explanation, numerous details have been set forth in order to provide an understanding of various embodiments of the present technology. It will be apparent to one skilled in the art, however, that certain embodiments may be practiced without some of these details, or with additional details.

Having disclosed several embodiments, it will be recognized by those of skill in the art that various modifications, alternative constructions, and equivalents may be used without departing from the spirit of the embodiments. Additionally, a number of well-known processes and elements have not been described in order to avoid unnecessarily obscuring the present technology. Accordingly, the above description should not be taken as limiting the scope of the technology. Additionally, methods or processes may be described as sequential or in steps, but it is to be understood that the operations may be performed concurrently, or in different orders than listed.

Where a range of values is provided, it is understood that each intervening value, to the smallest fraction of the unit of the lower limit, unless the context clearly dictates otherwise, between the upper and lower limits of that range is also specifically disclosed. Any narrower range between any stated values or unstated intervening values in a stated range and any other stated or intervening value in that stated range is encompassed. The upper and lower limits of those smaller ranges may independently be included or excluded in the range, and each range where either, neither, or both limits are included in the smaller ranges is also encompassed within the technology, subject to any specifically excluded limit in the stated range. Where the stated range includes one or both of the limits, ranges excluding either or both of those included limits are also included.

As used herein and in the appended claims, the singular forms “a”, “an”, and “the” include plural references unless the context clearly dictates otherwise. Thus, for example, reference to “an aperture” includes a plurality of such apertures, and reference to “the plate” includes reference to one or more plates and equivalents thereof known to those skilled in the art, and so forth.

Also, the words “comprise(s)”, “comprising”, “contain(s)”, “containing”, “include(s)”, and “including”, when used in this specification and in the following claims, are intended to specify the presence of stated features, integers, components, or operations, but they do not preclude the presence or addition of one or more other features, integers, components, operations, acts, or groups. 

1. A semiconductor processing chamber comprising: a remote plasma region; and a processing region fluidly coupled with the remote plasma region, wherein: the processing region is configured to house a substrate on a support pedestal, the support pedestal comprises a first material at an interior region of the pedestal, the support pedestal comprises an annular member coupled with a distal portion of the pedestal, and the annular member comprises a second material different from the first material.
 2. The semiconductor processing chamber of claim 1, wherein the annular member comprises a first material plated with the second material.
 3. The semiconductor processing chamber of claim 2, wherein the second material is not disposed on surfaces of the annular member in contact with the support pedestal.
 4. The semiconductor processing chamber of claim 1, wherein the annular member extends along an external edge of the pedestal towards a stem region of the pedestal.
 5. The semiconductor processing chamber of claim 1, wherein the support pedestal comprises an upper surface, and wherein the annular member extends vertically above the upper surface of the support pedestal.
 6. The semiconductor processing chamber of claim 1, wherein the annular member is coupled with the support pedestal at an edge region beyond the dimensions of a centrally located substrate region.
 7. The semiconductor processing chamber of claim 1, wherein fluorine has a higher affinity to the second material than the first material.
 8. The semiconductor processing chamber of claim 7, wherein the second material comprises nickel or platinum.
 9. The semiconductor processing chamber of claim 1, wherein the processing region is at least partially defined by a sidewall and wherein the sidewall comprises the second material.
 10. The semiconductor processing chamber of claim 1, wherein a sidewall heating element is embedded in the sidewall proximate the showerhead.
 11. The semiconductor processing chamber of claim 10, wherein the support pedestal further comprises a pedestal temperature control.
 12. The semiconductor processing chamber of claim 11, wherein the pedestal temperature control is configured to maintain the pedestal at a first temperature, wherein the sidewall heating element is configured to maintain the annular member at a second temperature, and wherein the second temperature is greater than the first temperature.
 13. A semiconductor processing chamber comprising: a remote plasma region; and a processing region fluidly coupled with the remote plasma region, wherein: the processing region is at least partially defined by each of a showerhead, a substrate support pedestal comprising a first material, and a sidewall, the sidewall includes a liner on an interior chamber surface comprising a second material different from the first material, and a resistive heater is embedded in the sidewall.
 14. The semiconductor processing chamber of claim 13, wherein the pedestal comprises a platform coupled with a stem, and wherein the liner is disposed on the sidewall from the showerhead to a distance proximate the intersection between the coupled platform and stem.
 15. The semiconductor processing chamber of claim 13, wherein the pedestal comprises a temperature control, and wherein the temperature control is configured to maintain a substrate temperature at least 20° C. below the sidewall temperature maintained by the resistive heater.
 16. The semiconductor processing chamber of claim 13, wherein the resistive heater is located within the sidewall proximate the showerhead.
 17. A method of etching a substrate, the method comprising: delivering plasma effluents through a showerhead into a semiconductor processing region; contacting a substrate residing on a support pedestal with the plasma effluents, wherein the support pedestal comprises a first material, wherein the support pedestal comprises an annular member coupled with a distal portion of the pedestal, and wherein the annular member comprises a second material different from the first material; and substantially maintaining the annular member at a temperature above about 50° C.
 18. The method of claim 17, wherein an edge etch rate of the substrate is within about 5% of a central etch rate of the substrate.
 19. The method of claim 17, wherein the processing region is substantially devoid of plasma during the contacting operation. 